Low temperature epitaxy of high-quality Ge buffer using plasma enhancement via UHV-CVD system for photonic device applications
Low temperature epitaxy of high-quality Ge buffer using plasma enhancement via UHV-CVD system for photonic device applications
Bader Alharthi,Wei Dou,8 Authors,Shui-Qing Yu
2019 · DOI: 10.1016/J.APSUSC.2019.03.062
Applications of Surface Science · 12 Citations